Abstract
High-volume production data shows that dies, which failed probe test on a semiconductor wafer, have a tendency to form certain unique patterns, i.e., defect clusters. Identifying such clusters is one of the crucial steps toward improvement of the fabrication process and design for manufacturing. This paper proposes a new technique for defect-cluster identification that combines data mining with a defect-cluster extraction using a Segmentation, Detection, and Cluster-Extraction algorithm. It offers high defect-extraction accuracy, without any significant increase in test time and cost.
| Original language | English |
|---|---|
| Article number | 5740361 |
| Pages (from-to) | 3300-3317 |
| Number of pages | 18 |
| Journal | IEEE Transactions on Instrumentation and Measurement |
| Volume | 60 |
| Issue number | 10 |
| DOIs | |
| Publication status | Published - Oct 2011 |
| Externally published | Yes |
UN SDGs
This output contributes to the following UN Sustainable Development Goals (SDGs)
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SDG 9 Industry, Innovation, and Infrastructure
Keywords
- Data mining
- defect-cluster extraction
- probe testing
- segmentation
- semiconductor manufacturing
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